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- Contact us
Global ETS offers SEM testing services with EDS analysis on Hitachi model SU70 for imaging, and elemental analysis. The SEM uses an electron optical system consisting of a series of electromagnets to focus and scan a beam of electrons over the area to be imaged. Because the SEM illuminates the specimen using electrons it can achieve magnification greater than 1000 times that of a light microscope.
Electron Beam Lithography (EBL) and Electron Beam Induced Deposition (EBID) are used to fabricating nanoscale devices. EBL is a resist-based Lithography similar to optical lithography. Pattern designs are scanned onto the resist using the electron beam of the SEM.
The resist is then developed leaving behind a copy of the pattern. EBID is direct-write lithography that uses a Gas Injection System (GIS) to deposit nanostructures by Chemical Vapor Deposition (CVD). The electron beam induces deposition of the injected gas on the substrate directly, avoiding the need for a mask. Both etching and deposition can be performed depending on the gas used.
1nm Resolution 15kV aat 4mm Working Distance
800,000x magnification
Thermal Field Emission Source
Remote control Capability
3D Rendering and Metrology
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