SEM & EDS Testing Services


Global ETS offers SEM testing services with EDS analysis on Hitachi model SU70 for imaging, and elemental analysis. The SEM uses an electron optical system consisting of a series of electromagnets to focus and scan a beam of electrons over the area to be imaged. Because the SEM illuminates the specimen using electrons it can achieve magnification greater than 1000 times that of a light microscope.

Electron Beam Nano-fabrication

Electron Beam Lithography (EBL) and Electron Beam Induced Deposition (EBID) are used to fabricating nanoscale devices. EBL is a resist-based Lithography similar to optical lithography. Pattern designs are scanned onto the resist using the electron beam of the SEM.
The resist is then developed leaving behind a copy of the pattern. EBID is direct-write lithography that uses a Gas Injection System (GIS) to deposit nanostructures by Chemical Vapor Deposition (CVD). The electron beam induces deposition of the injected gas on the substrate directly, avoiding the need for a mask. Both etching and deposition can be performed depending on the gas used.


  • 1nm Resolution 15kV aat 4mm Working Distance

  • 800,000x magnification

  • Thermal Field Emission Source 

  • Remote control Capability 

  • 3D Rendering and Metrology